Process variation aware OPC with variational lithography modeling

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Authors: Peng Yu University of Texas at Austin, Austin, TX
Sean X. Shi University of Texas at Austin, Austin, TX
David Z. Pan University of Texas at Austin, Austin, TX
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· Proceeding
DAC '06 Proceedings of the 43rd annual Design Automation Conference
Pages 785-790
ACM New York, NY, USA ©2006
table of contents ISBN:1-59593-381-6 doi>10.1145/1146909.1147108
Process variation aware OPC with variational lithography modeling Published by ACM 2006 Article
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· Citation Count: 9


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