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Predicting variability in nanoscale lithography processes

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Authors: Dragoljub Gagi Drmanac University of California, Santa Barbara
Frank Liu IBM, Austin Research Lab
Li-C. Wang University of California, Santa Barbara
Published in:
· Proceeding
DAC '09 Proceedings of the 46th Annual Design Automation Conference
ACM New York, NY, USA ©2009
table of contents ISBN: 978-1-60558-497-3 doi>10.1145/1629911.1630053
Predicting variability in nanoscale lithography processes Published by ACM 2009 Article
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· Downloads (12 Months): 26
· Citation Count: 3


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